Multi-Stripe Multilayer Coating for Synchrotrons

At Incoatec we also produce optimized multilayer optics to suit your applications. Our experience over the years with a large variety of materials has enabled this. We currently have more than 50 different target materials on stock. We also have experience in coating with different layer combinations. The theoretically best combination of materials does not always fit together in practice due to interdiffusion or interface roughening. However, we are able to find the best viable way for you. Last but not least, our deposition technique features the high precision, which is necessary for modern multilayer synchrotron optics. The transmission electron microscopy micrograph is demonstrated. We are able to deposit uniform films with homogeneities < 0.1% as well as all kinds of gradients.

TEM micrograph of a multilayer mirror Mo/B4C with a d-spacing of 1.4 nm and 500 pairs

The figure below shows a multi-stripe optic for the tomography beamline at the Swiss Light Source. We produced a Ru/C multilayer with 100 layer pairs and a single layer thickness of 2nm for reflecting energies in the range of 10 to 22 keV. A second multilayer underneath consists of W/Si with single layer thicknesses of 1.5nm for the energy range of 22 to 45 keV. In between these two multilayers, the Si 111 substrate also acts as a reflecting element. The optical element has a length of 30 cm. The multilayers are deposited with a precision of single layer thickness of below ± 1%.

Uncoated Si-substrate and mounted multi-stripe multilayer optic for reflecting a wide range of energies at a tomography beamline. (Photo courtesy of M. Stampanoni, PSI-SLS)

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